Ultrapure resin for semiconductors and nuclear power
In theory, ultrapure water refers to water having a resistivity greater than 18 MΩ*cm (25 °C) or close to 18.3 MΩ*cm (25 °C). In addition to water molecules, this water has almost no impurities, and there are no organic substances such as bacteria, viruses, and chlorine-containing dioxins.
Ultrapure water is mainly used to develop ultra-pure materials, such as semiconductor original materials, nano-fine ceramic materials, and water for nuclear power industry.
Such water is difficult to achieve in the general process. Theoretically, it can be treated by two-stage reverse osmosis and then through a series of mixed exchange resin polishing.
Ultrapure water is currently used mainly in the semiconductor industry and the nuclear industry.
In the electronics industry, from the cleaning of various electronic components to the preparation of a series of process solutions, high-quality pure water is needed, especially for the production of semiconductor devices and large-scale integrated circuits. Ultra-pure is used in almost every Water cleaning process. Ultrapure water prepared by electronic grade resin basically requires a resistance of 15 MΩ*cm (25 °C) or more.
The water treatment of nuclear power plants is completely different from that encountered in ordinary power plants. In nuclear power plant circuits, and in environments where all activities must be eliminated, it is absolutely essential that the resin used does not release any ions or substances that can cause precipitation and corrosion. Therefore, the nuclear grade resin must have extremely high stability, must reach a very high level of regeneration, and must have a very high purity.
Ultrapure water prepared by nuclear grade resin basically requires a resistance of 18 MΩ*cm (25 °C) or more.